Accurate Film Thickness Measurement with F/4 Cross-Type Optical Design Fiber Optic Spectrometer

Essential for semiconductor, photovoltaic panel, and display technology applications, our spectrometer provides non-destructive, high-speed film thickness measurements. Combining advanced optical instrumentation with AI algorithms, this system optimizes film production processes while ensuring superior quality control.

Note: Models marked with * are primarily designed for Raman applications.

• High quantum efficiency: 92% peak @650nm, 83% @232nm
• Superior signal-to-noise ratio: Ultra-low dark noise with SNR up to 1000:1
• Clear processing of weak signals during long exposure with strong environmental adaptation
• Low-noise, high-speed circuitry with USB3.0 interface

When light from the optical fiber probe interacts with the film, dual reflections occur at both the air-film surface and film-substrate interface. The resulting interference patterns produce spectral fringes detected by the spectrometer. The optical path difference enables precise thickness determination using the extremum method, with inputs including θ, n, and spectral peaks. Thicker films exhibit tighter fringe spacing, while longer wavelengths create wider spacing. Measurement accuracy is optimized through proper wavelength and resolution settings.

• Absorption, transmittance, and reflection spectrum analysis
• Light source and laser wavelength characterization
• OEM modules for fluorescence and Raman spectroscopy