92% High Quantum Spectrometer for Film Thickness Measurement Spectral Range 200nm 1100nm

Thin film technology plays a vital role across industries like semiconductors, solar energy, displays, and optical coatings. Our high quantum efficiency spectrometer provides precise, non-contact thickness measurement for analyzing surface morphology, combining smart algorithms with optical devices for accurate quality assessment.

• High quantum efficiency: 92% peak @650nm, 83% @232nm
• High SNR: Ultra-low dark noise with SNR up to 1000:1
• Noise-free processing of weak signals in long exposure
• Low-noise, high-speed circuit with USB3.0 interface

The spectrometer analyzes interference patterns created by reflected beams from film surfaces and substrate boundaries. Film thickness is calculated using the extremum method, accounting for incident angle, refractive index, and spectral peak positions. This non-contact method provides precise measurements for quality control and process improvement.

• Absorption, transmittance and reflection spectrum analysis
• Light source and laser wavelength characterization
• OEM modules for fluorescence and Raman spectroscopy

Note: Models marked with * are primarily designed for Raman applications.